Poids de l’Open access dans la production CNRS
Home
Resources
Graphs
Search
Export
Sign in
Titre
Study of surface reaction during selective epitaxy growth of silicon by thermodynamic analysis and density functional theory calculation
XX
BSO - Titre
Study of surface reaction during selective epitaxy growth of silicon by thermodynamic analysis and density functional theory calculation
XX
DOI
DOI
10.1016/j.jcrysgro.2017.01.006
XX
DOAI
DOAI
10.1016/j.jcrysgro.2017.01.006
XX
Identifiant WoS
WOS:000404750000060
XX
Accès ouvert
OA - Non
XX
Source - Accès ouvert
OA - Non
XX
Type d'accès
Non OA
XX
Editeur
Elsevier
XX
Source
JOURNAL OF CRYSTAL GROWTH
XX
ISSN
0022-0248
XX
Type de document
Article
XX
Notoriété
2 - Acceptable
XX
CNRS
Oui
XX
CNRS - Institut
INC - Institut de chimie
XX
uid:/35DGD4Z1
12/10/2021 14:52:46 (latest)
Add field
Share/Export
Powered by
Lodex
9.6.0
