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Titre
Oxidation kinetics of Si and SiGe by dry rapid thermal oxidation, in-situ steam generation oxidation and dry furnace oxidation
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BSO - Titre
Oxidation kinetics of Si and SiGe by dry rapid thermal oxidation, in-situ steam generation oxidation and dry furnace oxidation
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DOI
DOI
10.1063/1.4987040
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DOAI
DOAI
10.1063/1.4987040
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Identifiant WoS
WOS:000404300600037
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Accès ouvert
OA - Non
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Source - Accès ouvert
OA - Non
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Type d'accès
Non OA
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Editeur
AIP Publishing
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Source
JOURNAL OF APPLIED PHYSICS
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ISSN
0021-8979
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Type de document
Article
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Notoriété
3 - Correcte
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CNRS
Oui
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CNRS - Institut
INC - Institut de chimie
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uid:/DW6GS4XS
12/10/2021 14:52:46 (latest)
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