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Titre
Ultrashort pulse laser processing of silica at high repetition ratesfrom network change to residual strain
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BSO - Titre
Ultrashort pulse laser processing of silica at high repetition rates-from network change to residual strain
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DOI
DOI
10.1111/ijag.12221
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DOAI
DOAI
10.1111/ijag.12221
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Identifiant WoS
WOS:000403438200010
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Accès ouvert
OA - Non
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Source - Accès ouvert
OA - Non
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Type d'accès
Non OA
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Editeur
Wiley
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Source
INTERNATIONAL JOURNAL OF APPLIED GLASS SCIENCE
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ISSN
2041-1286
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Type de document
Article
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Notoriété
4 - Excellente
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CNRS
Oui
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CNRS - Institut
INC - Institut de chimie
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uid:/QLF54MZ2
12/10/2021 14:52:45 (latest)
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